Research Cluster: Materials

High-Pressure Torsion (HPT) allows extreme deformation of materials with almost no restrictions on applicable strains, including materials that are typically difficult to deform. It is a powerful tool for varying processing parameters (temperature, strain rate, pressure, cyclic strain paths), consolidating powders into bulk nanocomposites, and estimating flow stress evolution by measuring the applied torque. Depending on the device and material, sample sizes up to 100 mm in diameter can be processed.

High-Pressure Torsion (HPT) allows extreme deformation of materials with almost no restrictions on applicable strains, including materials that are typically difficult to deform. It is a powerful tool for varying processing parameters (temperature, strain rate, pressure, cyclic strain paths), consolidating powders into bulk nanocomposites, and estimating flow stress evolution by measuring the applied torque. Depending on the device and material, sample sizes up to 100 mm in diameter can be processed.

High-Pressure Torsion (HPT) allows extreme deformation of materials with almost no restrictions on applicable strains, including materials that are typically difficult to deform. It is a powerful tool for varying processing parameters (temperature, strain rate, pressure, cyclic strain paths), consolidating powders into bulk nanocomposites, and estimating flow stress evolution by measuring the applied torque. Depending on the device and material, sample sizes up to 100 mm in diameter can be processed.

The ESI operates several general-purpose electrochemical workstations (Biologic SP-300, PARSTAT 4000A, Gamry Interface 1010E, PalmSens 4) for advanced research. These systems support techniques such as cyclic voltammetry, chronopotentiometry, and linear sweep voltammetry. Applications range from the synthesis of nanostructured materials and metallic thin films to corrosion analysis, impedance characterization, and the evaluation of electrocatalysts for hydrogen evolution and CO2 reduction.

The Tescan MAGNA is an ultra-high resolution SEM using immersion optics and a crossover-free electron beam. It is designed for diverse material investigations, offering excellent imaging even at low electron energies. The system features a low vacuum mode for non-conductive samples and integrated detectors for quantitative chemical and microstructural analysis.

The JEOL JEM-2220FS “Nanomap” is a field emission gun (scanning) transmission electron microscope equipped with in-column energy filter, high speed CMOS camera, windowless EDS detector for chemical analysis and direct electron detector and scan generator for precession nanodiffraction mapping and 4D STEM. A wide range of in situ holders along with a high-speed CMOS detector enables imaging dynamical processes in complex materials with nanometer resolution. A unique setup combining in column omega filter, direct electron detector and programmable scan generator allows to carry out energy-filtered 4D STEM and precession nanodiffraction mapping.

The Rigaku SmartLab is a state-of-the art general-purpose XRD system equipped with a high-precision 5-circle goniometer, i.e. featuring an in-plane arm for measurements without the need for sample tilting.

The JEOL JEM-2220FS “Nanomap” is a field emission gun (scanning) transmission electron microscope equipped with in-column energy filter, high speed CMOS camera, windowless EDS detector for chemical analysis and direct electron detector and scan generator for precession nanodiffraction mapping and 4D STEM. A wide range of in situ holders along with a high-speed CMOS detector enables imaging dynamical processes in complex materials with nanometer resolution. A unique setup combining in column omega filter, direct electron detector and programmable scan generator allows to carry out energy-filtered 4D STEM and precession nanodiffraction mapping.

The Hysitron (now Bruker) PI 95 Picoindenter is a state-of-the-art instrument that revolutionizes in situ nanomechanical mechanical testing in combination with our JEOL 2200FS transmission electron microscope. Hence, the PI 95 enables exploring the intricacies of material behavior under mechanical stress and opens a world of possibilities for scientific advancements and engineering breakthroughs. At our institute, it is used at the forefront of nanoscale research, pushing the boundaries of materials science, nanotechnology, and semiconductor studies. Our work relies on cutting-edge tools and techniques that allow us to delve into the mechanical properties of materials at the smallest scales. This powerful combination brings forth unparalleled opportunities for nanoscale research and material characterization.

ESI is home to two 90° bending jigs: commercially available YUASA and the custom-build FLEX-E-TEST. Both instruments can be used to evaluate the bending resistance of materials used in flexible electronics, such as a foldable phone. Both include configurations to monitor the electrical resistance in-situ during bending.

ESI is home to two 90° bending jigs: commercially available YUASA and the custom-build FLEX-E-TEST. Both instruments can be used to evaluate the bending resistance of materials used in flexible electronics, such as a foldable phone. Both include configurations to monitor the electrical resistance in-situ during bending.

The advent of integrated atomic force microscopes (AFMs) in stand-alone scanning electron microscopes (SEMs) opened new possibilities due to quantitative 3D information on complex surface morphologies. The combination of an AFM in situ in the SEM, termed AFSEM, allows for high depth resolution imaging of sample surfaces. The SEM is used for positioning of the AFM cantilever near the site of interest. The combination expands the information for both techniques due to the quasi-simultaneous correlation within one setup. While the SEM acts as the high-resolution navigation tool, the integrated AFM solution provides laterally resolved, quantitative height information with nm and even sub-nm resolution in XY and Z, respectively. This is an enormous advantage as it is very complicated to distinguish between real surface features on the lower nanoscale and coverage layers via SEM due to the electron beam penetration depth.

Bruker’s Dimension Icon® brings the highest levels of performance, functionality, and AFM accessibility to nanoscale researchers in science and industry. Building upon the world’s most utilized large-sample AFM platform, it is the culmination of decades of technological innovation, customer feedback, and industry-leading application flexibility. The system has been designed from top to bottom to deliver the revolutionary low drift and low noise that allows users to achieve artifact-free images in minutes instead of hours. At ESI, in addition to contact mode and intermittent contact mode (tapping), our Icon is equipped with Scan Asyst, Magnetic Force measurements (MFM), contact resistance (CR) and nanomechanical cantilevers (indent with AFM) for mechanical properties, as well as heating/cooling stages (-10°C up to 250°C).

The Wafer Curvature technique offers fast, non-destructive, in-situ determination of thin-film stresses during thermal processes. Utilizing a two-dimensional laser beam array and a high-power resistive heating plate in a vacuum chamber, the system calculates film stress in real time by measuring the differential laser beam deflection caused by the bending of the film/substrate stack. It enables measurements up to 1000°C with variable heating and cooling rates from 0.01 K/s up to several K/s. This is critical for controlling "built-in" stresses and preventing delamination or cracking in metallic, ceramic, and amorphous films.

Printer for testing ink jet inks with dropwatcher.

Optical lithography for pattern reproduction in photoresist films.

Dry etching and surface functionalization of organic and inorganic materials with reactive gases.

Qualitative and quantitative analysis of elemental surface composition of solid samples, determination of chemical species, mapping and depth profiling of elemental composition. Surface characterization, elemental analysis, chemical State Imaging and rapid survey spectrum acquisition.

Determination of the surface polarity and the surface energy of materials.

Determination of the viscosity of fluids.

Characterization of photo-initiated reactions in a broad variety of materials.

Determination of a temperature induced weight loss as well as the heat flow into the sample.

Qualitative and quantitative analysis of the major compounds/chemical structure of solid samples in combination with optical microscopy in a defined spot of the sample, mapping mode

1H and 13C NMR spectroscopy, NMReady- 60Pro, Nanalysis Qualitative and quantitative analysis of the chemical structure of liquid or dissolved samples; 60 MHz, Benchtop NMR spectrometer. NMReady-60 spectrometer operates at field strengths of 1.4 Tesla. For 1Hz, the resonance frequencies (Larmor frequencies) then correspond to 60 MHz.

Thermo-mechanical material testing under tensile, bending, compression or shear loading.

The G200 Platform Nanoindenter is a versatile nanoindenter designed to perform nanoindentation measurements and micromechanical investigations in the nano- and micro-deformation ranges. Thanks to the development of a wide range of advanced nanoindentation protocols, this instrument allows for the easy determination of not only hardness and modulus but also strain rate dependencies, activation volume, and local flow curves using a novel spherical method. In addition to measurement capabilities at room temperature, this G200 is equipped with a Surface-Tec laser heater and offers two different options for electrochemical loading during micromechanical investigations.

This unique high-temperature nanoindenter in a scanning electron microscope (SEM) allows local and precise measurements of the mechanical properties from room temperature up to 1000 °C. This new testing machine supports the application-oriented portfolio of the Chair of Physical Metallurgy and Metallic Materials and allows high-resolution correlation between microstructure analysis and macroscopic deformation experiments.

The modular design allows to use the Alemnis Standard Assembly (ASA) for in-situ and ex-situ experiments at room temperature, while the additional Low Temperature Module (LTM-CRYO) can be utilized to perform in-situ experiments at temperatures between -150 °C and 200 °C. In the ex-situ configuration, the ASA can be used as a stand-alone nanoindenter equipped with an optical microscope to navigate over the sample surface. For live observation of indentation or micromechanical experiments, the setup can be equipped to the available Tescan Vega scanning electron microscope. This in-situ configuration allows to use the LTM-CRYO module, where liquid nitrogen cooling enables controlled indentation experiments at cryogenic temperatures. In addition to its capacity for conducting tests at cryogenic temperatures, the new indentation system distinguishes itself with its intrinsic displacement control mechanism. Unlike the load-controlled indentation systems existing at the Department, this feature enables superior control, particularly during micromechanical experiments.

The mechanical properties of composite and multilayered materials can vary significantly within the micro- and nanometer scale. Thus, quantification of hardness and Young’s modulus with a high depth and lateral resolution is of major scientific and industrial relevance. In addition, modern nanoindentation devices allow to perform micro mechanical experiments on microscopic bending beams, making it possible to quantify the fracture stress and fracture toughness even for thin coatings. With the Hysitron TI 950 nanoindenter (“Herta”) it is furthermore possible to conduct hardness and Young’s modulus mappings. A fully automated indentation system, several transducers for different types of experiments and a light microscope allow sophisticated nanoindentation measurements. In addition, the surface can be scanned using the implemented tip to retrieve information on the surface morphology.

Universal testing machine with a wide test frame for carrying out tensile, compression and bending tests up to maximum loads of 250 kN.

Universal testing machine for carrying out tensile, compression and bending tests up to maximum loads of 50 kN. Option for high-temperature tests up to 1000°C.

Hydraulic fatigue testing machines are used to determine S/N-curves (Woehler curves), endurance limits and to test materials in LCF-and HCF-areas. The testing can be done also in corrosive environment.

The two CSM Instruments high-temperature tribometers of type ball-on-disk and pin-on-disk allow tribological investigations at temperatures between room temperature and 1000°C. Sliding contacts of materials in different atmospheres under dry and lubricated conditions can be studied. The coefficient of friction is measured during the test and plotted versus the sliding distance. Using a white light profilometer, the area of the wear track can be measured and wear rates can be calculated.

Automates hardness testing equipment for single tests, hardness line profiles (for analysing the nitriding depth and hardness penetration depth).

Hardness testing and evaluation of the strength of metallic materials according to the Vickers and Brinell method. The device type M4C 025 G3M allows load up to 2,5 kN. The testing is done according to DIN EN ISO 6507 and DIN EN ISO 6506.

The Mitutoyo Durotwin Rockwell hardness tester can be used not only for standard Rockwell hardness testing but also for evaluating the adhesion strength of thin hard coatings in accordance with VDI Guideline 3198. In this method, a Rockwell-C diamond is pressed into a coated substrate with sufficient hardness using a test load of 1.47 kN. The resulting coating delamination around the indentation is classified into one of the six VDI adhesion strength classes.

The impact testing machine RKP450 is built for instrumented testing according to Charpy and IZOD, as well as for tensile impact testing. The machine has a chamber that allows the temperature control of samples from -190 °C to 700 °C. The test starts automatically after the desired temperature is reached.

The machine allows estimation of rotational bending moments. Tests can be done in air and in corrosive environments.

The CSM Instruments Calowear test is used to determine coating thickness and abrasive wear resistance of coated and uncoated samples via a ball cratering technique. There, a steel ball rotates under defined conditions (load, rotation speed) against the sample surface. Adding an abrasive slurry (diamond paste, silicon carbide or aluminum oxide powder), a ball crater is created. The diameter of this crater is determined by an optical microscrope and from its increase with raising grinding duration the abrasive wear coefficient is calculated.

The sputter system “Debbie” is a versatile specifically designed high-vacuum (base pressure 10-8 mbar), computer-controlled lab-scale coating system (ATC 1800 UHV, AJA Int.) equipped with four sputter sources arranged in a confocal configuration, which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis thin film deposition. These sources can be operated in both d.c. and bipolar pulsed d.c. modes and feature a modular magnet array. Such configuration allows for deposition of conductive and non-conductive, magnetic and non-magnetic, monolithic films as well as multi-layered thin films. The system is also well suitable for combinatorial materials synthesis and fast material screening.

The sputter system “Josefine II” is a home-made lab-scale coating system equipped with three unbalanced magnetrons with shutter systems, focused on a rotating substrate holder. The magnetrons are supplied by bipolar pulsed d.c. power supplies, which allows deposition of conductive and non-conductive coatings. Substrates can be heated or biased with d.c. or bipolar pulsed d.c. voltages. Typical coating materials are metals, alloys, nitrides, and oxides, which can be deposited as nanocomposites and superlattices.

The nanoparticle deposition system “NANCY” consists of a Moorfield MiniLab 125 platform and a Nikalyte NL-UHV nanoparticle source. The former is equipped with a d.c. magnetron sputtering source for thin film synthesis in inert Ar and reactive N2 and O2 atmospheres. The latter consists of an NL-DX3 3-head magnetron, which allows deposition of nanoparticles from up to three materials both individually and simultaneously, and an NL-QMS quadrupole mass filter for nanoparticle size measurement and selection. Furthermore, the system comprises a load-lock chamber for rapid sample exchange. Typical applications include the functionalization of nanoporous carbons for hydrogen storage, antimicrobial coatings, and the functionalization of gas sensors.

The FHR. Line.600-V („DCrystl“) is a modular inline sputter system for film deposition on flat substrates (glass, silicon, polymers) for display technology, touch panels, photovoltaics, microelectronics and architectural glass. The system consists of a load-lock chamber and a combined pre-treatment and coating chamber with a cylindrical and a planar magnetron. The system is employed for the synthesis of metal, nitride and oxide thin films.

The CemeCon CC800800/9MLT (“Conny”) is an industrial sputter system equipped with four bipolar pulsed d.c. magnetrons. It is designed to deposit both conductive and non-conductive films. To increase the ionization rate during substrate etching, the CemeCon booster technology can be additionally applied. The maximum deposition temperature is 650°C. The system is optimized to deposit hard coatings based on nitrides and oxides on tools and components. It is used for basic research, but also for applied research and for coating of prototypes.

The laboratory deposition system “Esmeralda” is a custom-built system for the flexible low-temperature synthesis of functional thin films and for plasma characterisation. It is used for fundamental research with the main focus on depositing dense thin films on temperature sensitive substrate materials. The system comprises an unbalanced magnetron, that can be used in d.c. and in HiPIMS (high power impulse magnetron sputtering) mode, and a d.c. cathodic arc source. Thin film synthesis can be performed in vacuum (cathodic arc) and in inert Ar as well as reactive N2 and O2 atmosphere.

The Langmuir probe of type Hiden ESP allows the determination of the characteristics of low-pressure plasmas, as used in plasma-assisted vapor deposition. Designed as a tungsten wire probe, characteristic values like ion and electron flux as well as plasma and floating potential can be determined via a computer-assisted data control and acquisition system.

The sputter process monitor Pfeiffer SPM 200 is used for residual gas analysis and leak detection in high vacuum systems as well as for process gas analysis in vacuum coating deposition systems. It consists of a quadrupole mass spectrometer, which forms together with a turbomolecular pumping system and a data acquisition system a mobile analysis station. The differentially pumped system can be connected to vacuum systems via a vacuum hose.

To analyze the crystallographic structure of thin films, powders, and crystalline bulk materials, two high-resolution X-ray diffraction (XRD) systems from Bruker’s D8 series are available: a D8 DISCOVER for complex thin film systems and a D8 ADVANCE for precise powder analyses. These instruments enable phase identification and quantification, texture and residual stress measurements, as well as in-situ investigations under variable atmospheric conditions. Using monochromatic Cu-Kα radiation and energy-resolving detectors, reflections at the crystal lattice can be detected and analyzed with high precision. Advanced components such as the EIGER2 R 500K detector with 0D, 1D, and 2D capabilities and modular optical systems ensure top data quality alongside flexible configuration options. The use of a Eulerian cradle and precision motorized axes further allows detailed investigation of textures and residual stresses in samples of various geometries. The versatile equipment setup, including interchangeable optics, adaptable sample holders, and specialized chambers, also enables complex measurement routines – from grazing incidence and reciprocal space mapping to high-temperature and reactive environment studies under controlled atmospheres.

The biaxial stress-temperature measuring system “Mutti 2000” is a self-constructed facility to measure the temperature dependency of stresses in thin films. Using two parallel laser beams, the curvature resulting from the stresses of a substrate coated on one side can be measured and the stresses can be calculated. The sample is positioned in a high-vacuum chamber, enabling to investigate stress relaxation mechanisms in-situ during a thermal cycle up to 700°C. In addition to stresses and stress relaxation effects, the thermal expansion coefficient of the film can be determined from the thermal cycle.

Raman spectroscopy can be applied for the characterization of chemical bonds, phase changes or oxidation processes of construction and functional materials. The underlying Raman effect is based on the inelastic scattering of the light from a laser on the molecules within a sample. Thus, the chemical fingerprint of the sample can be characterized both laterally and depth resolved. Raman spectroscopy can be applied for a variety of material classes, for instance ceramics, polymers and semiconductors. Using the attached heating chamber allows to investigate the material behavior in-situ up to a temperature of 1500 °C.

The vacuum cold-wall furnace of type HTM-Reetz (“Luzi”) enables vacuum annealing treatments at temperatures of up to 1600°C. The water-cooled vacuum chamber with tungsten heater is loaded from the bottom. The maximum working space is 100 mm in diameter and 150 mm in height. Temperature is controlled by thermocouples, where temperature-time sequences can be programmed via a computer.

The microscope is used for the characterisation of surface by recording and analysing 3 dimensional surface topographies. The laser beam scans the surface in x and y direction while a stepwise change of the focus point is achieved via the objective. The microscope is applied to analyse surface subjected to mechanical loading, e.g. after tribological tests, to measure 3 dimensional structure in microelectronics and nanoelectronics, to measure the thickness of opaque and transparent films as well as to determine the surface roughness.

The HEX system by Korvus Technology is a compact, modular thin-film deposition system designed for versatile research and development. It features a hexagonal high-vacuum chamber that supports multiple deposition techniques, including magnetron sputtering, thermal evaporation, and electron beam evaporation. The system allows for the sputtering of solid metals, magnetic materials, insulators, and semiconductors, as well as the combination of multiple sources to create composite thin films.

The JEOL JCM-6000plus Scanning Electron Microscope (SEM) enables high-resolution imaging and chemical analysis of material surfaces. Equipped with Secondary Electron (SE), Backscattered Electron (BSE), and Energy Dispersive X-ray (EDX) detectors, the system provides highly magnified microstructural images. It is primarily used for the analysis of polished cross-sections and fracture surfaces. A special focus lies on fractographic investigations for failure analysis to accurately identify failure-initiating defects in samples and components.

The Lock-in Thermography system, equipped with a Velox 1310k SM infrared camera, is utilized for the non-destructive testing and failure analysis of microelectronic and electroceramic components. In this process, a sinusoidal voltage is applied to the sample, inducing targeted, periodic heating. The infrared camera records these thermal signatures, which are subsequently analyzed using Fourier transformation. This allows for the precise localization of defects based on their distinct thermal behavior. The technique serves as an excellent tool for micro-scale current measurement, for instance, to visualize the component-determining junctions in electroceramic varistors.

The PS4 micromanipulator is designed for the precise electrical characterization of grain boundaries. The system features four micromanipulators arranged radially around a sample, which is mounted on an x-y movable substage. Because each tungsten measuring tip (with a tip radius of 150 nm) can be positioned independently alongside the movable sample, the PS4 offers significantly higher flexibility and efficiency than conventional methods. The use of tungsten tips ensures low contact resistance and highly stable measurements, enabling contact voltages down to 0.6 mV (corresponding to contact resistances in the kΩ range).

The NETZSCH DIL 402 C pushrod dilatometer is designed for high-precision measurements of thermal length changes (Coefficient of Thermal Expansion, CTE) in solids, powders, and pastes. The system operates across a wide temperature range from room temperature up to 2000 °C. A key technical feature is the automatic determination of the initial sample length using a predefined contact force. This specific force is maintained consistently throughout the entire measurement process, ensuring highly reproducible and precise results. It is primarily used to characterize sintering kinetics, phase transitions, and softening behavior under controlled vacuum or inert gas atmospheres.

The Spark Plasma Sintering (SPS) press LSP 100 V1 is designed for the rapid sintering of laboratory-scale samples, specifically the sintering of ceramic green bodies under pressure. The major advantage of this technique lies in the fast heating rates (several 100 °C/min) under isostatic pressure, which significantly reduces the overall process time. This rapid processing results in a homogeneous microstructure and effectively prevents undesirable grain growth.

The Tape Caster CAM-L252 is a laboratory-scale device designed for the production of ceramic green body tapes. A ceramic slurry (max. 0.2 L, mixed with up to 0.1 L of ethanol or water and other non-toxic additives) is cast onto a belt to form a thin film (approx. 50 μm) within 2 minutes. After drying, these tapes are stacked and then pressed using the ILS-66D isostatic press to achieve the highest possible green body density. Pressurization takes place in a closed pressure vessel using water (135 L + 25 L in the tank). Finally, the green bodies undergo debinding in specialized furnaces and are sintered into finished ceramic components.

The CeraFab 7500 3D printer (Lithoz GmbH) enables the precise printing of small 3D objects for experimental purposes. The system is based on Lithography-based Ceramic Manufacturing (LCM) technology, where a CAD model is digitally transferred directly to the machine. A slurry is automatically dosed and selectively exposed to visible light layer-by-layer using a state-of-the-art DMD projection system. After thermal post-processing (debinding and sintering) of the resulting three-dimensional 'green parts', fully dense ceramic components are created. The goal is the realization of so-called 'digital materials' or 'digital components', where properties such as color and mechanical strength can be selectively modified in 3D within the component.

The NETZSCH DIL 402 C pushrod dilatometer is designed for high-precision measurements of thermal length changes (Coefficient of Thermal Expansion, CTE) in solids, powders, and pastes. The system operates across a wide temperature range from room temperature up to 2000 °C. A key technical feature is the automatic determination of the initial sample length using a predefined contact force. This specific force is maintained consistently throughout the entire measurement process, ensuring highly reproducible and precise results. It is primarily used to characterize sintering kinetics, phase transitions, and softening behavior under controlled vacuum or inert gas atmospheres.

The JEOL JCM-6000plus Scanning Electron Microscope (SEM) enables high-resolution imaging and chemical analysis of material surfaces. Equipped with Secondary Electron (SE), Backscattered Electron (BSE), and Energy Dispersive X-ray (EDX) detectors, the system provides highly magnified microstructural images. It is primarily used for the analysis of polished cross-sections and fracture surfaces. A special focus lies on fractographic investigations for failure analysis to accurately identify failure-initiating defects in samples and components.

The ZSE 18 HP compounder from Leistritz is equipped with two dosing units one for polymers and one for metallic powders.

Single screw Extruder.

Electric injection moulding machine, as a loan by Arburg, for research and education.

Electric injection moulding machine, as a loan by Engel, for research and education.

Two component injection moulding machines, for the research of the bonding between two different polymers. Additionally, Machine Vision system and variothermal mould temperature control.

The high-pressure capillary rheometer is used for the rheological measurement of polymer melts and other fluids.

The high-pressure capillary rheometer is used for the rheological measurement of polymer melts and other fluids.

5-layer flat film line.

The Mflow is a modular extrusion plastometer designed to determine the Melt Mass-Flow Rate of thermoplastic materials

The MEX printers are an additive manufacturing machine using thermoplastic polymers.

Tensile, compression and flexural testing, deformation measurement by various optical and contact extensometers.

Mechanical characterization of materials with small specimen dimensions.

Three-dimensional full field deformation and strain analysis based on digital image correlation.

The Hysitron (now Bruker) PI 95 Picoindenter is a state-of-the-art instrument that revolutionizes in situ nanomechanical mechanical testing in combination with our JEOL 2200FS transmission electron microscope. Hence, the PI 95 enables exploring the intricacies of material behavior under mechanical stress and opens a world of possibilities for scientific advancements and engineering breakthroughs. At our institute, it is used at the forefront of nanoscale research, pushing the boundaries of materials science, nanotechnology, and semiconductor studies. Our work relies on cutting-edge tools and techniques that allow us to delve into the mechanical properties of materials at the smallest scales. This powerful combination brings forth unparalleled opportunities for nanoscale research and material characterization.

A JEOL JEM-2100F is field emission gun transmission electron microscope equipped with an image-side spherical aberration corrector (CEOS), Oxford INCA Energy TEM 200 EDS system, high-angle annular dark field detector, Gatan annular dark field detector/bright field detector, as well as Gatan (Tridiem) image filter (GIF) system. With the aberration corrector, the ultrahigh resolution atom imaging of crystal lattices can be readily achieved.

The JEOL JEM-2220FS “Nanomap” is a field emission gun (scanning) transmission electron microscope equipped with in-column energy filter, high speed CMOS camera, windowless EDS detector for chemical analysis and direct electron detector and scan generator for precession nanodiffraction mapping and 4D STEM. A wide range of in situ holders along with a high-speed CMOS detector enables imaging dynamical processes in complex materials with nanometer resolution. A unique setup combining in column omega filter, direct electron detector and programmable scan generator allows to carry out energy-filtered 4D STEM and precession nanodiffraction mapping.

The CEMPER workflow (Correlative Chemical, Electrical, and Mechanical Properties) utilizes a cryogenic process to analyze energy-related materials like hydrogen or lithium. At its core is the Helios 5 Plasma-FIB, which combines ultra-high brightness electron imaging with a Xenon plasma ion beam for fast material removal and site-specific sample extraction for TEM or mechanical testing.

The LEO 1540XB is a dual beam FIB workstation equipped with a field emission gun (FEG). It uses a highly focused Ga+ ion beam (2-30 keV) to precisely mill materials at the nanometer scale. It is primarily used at the ESI to fabricate micro-mechanical test specimens and prepare high-quality samples for TEM analysis.

The Zeiss Auriga LaserFIB combines CrossBeam technology (Ga+ ion FIB and Gemini SEM) with an integrated femtosecond pulse laser. The laser allows for material removal rates several orders of magnitude higher than standard FIB, with minimal thermal damage. It is an ideal tool for rapid sample preparation on the mesoscale and subsequent high-precision FIB processing.

The purpose of the TEM sample preparation lab is to provide advanced tools and techniques for preparing high-quality, electron-transparent samples for detailed analysis in transmission electron microscopy. The lab is equipped with state-of-the-art instruments designed for precise and efficient sample preparation, ensuring high-quality results. Functionality: Precision ion polishing system for uniform thinning and damage-free preparation of TEM samples.

The purpose of the TEM sample preparation lab is to provide advanced tools and techniques for preparing high-quality, electron-transparent samples for detailed analysis in transmission electron microscopy. The lab is equipped with state-of-the-art instruments designed for precise and efficient sample preparation, ensuring high-quality results. Functionality: Mechanical pre-thinning method to near electron transparency, reducing ion milling time.

The HEX system by Korvus Technology is a compact, modular thin-film deposition system designed for versatile research and development. It features a hexagonal high-vacuum chamber that supports multiple deposition techniques, including magnetron sputtering, thermal evaporation, and electron beam evaporation. The system allows for the sputtering of solid metals, magnetic materials, insulators, and semiconductors, as well as the combination of multiple sources to create composite thin films.

The Hysitron (now Bruker) PI 95 Picoindenter is a state-of-the-art instrument that revolutionizes in situ nanomechanical mechanical testing in combination with our JEOL 2200FS transmission electron microscope. Hence, the PI 95 enables exploring the intricacies of material behavior under mechanical stress and opens a world of possibilities for scientific advancements and engineering breakthroughs. At our institute, it is used at the forefront of nanoscale research, pushing the boundaries of materials science, nanotechnology, and semiconductor studies. Our work relies on cutting-edge tools and techniques that allow us to delve into the mechanical properties of materials at the smallest scales. This powerful combination brings forth unparalleled opportunities for nanoscale research and material characterization.

The FemtoTools FT-NMT04 is a cutting-edge nanoindentation device that enables precise mechanical characterization of materials at the nanoscale through a wide range of testing applications. Thanks to its modular design and integration with the scanning electron microscope (SEM), in-situ nanoindentation experiments as well as micro- and nanomechanical testing using different geometries can be straightforwardly conducted. Ex-situ nanoindentation experiments can also be performed in a controlled environment. The device offers various testing modes, including continuous stiffness measurement (CSM) and dynamic mechanical analysis (DMA). It features a piezo drive to achieve positioning with nanometer precision, with a noise floor of 50 pm. As the first commercially available nanoindentation device featuring a MEMS-based force sensor fabricated entirely from a single crystalline silicon wafer, it enables high sensitivity and resolution of the force readout, featuring a force range from 200 μN to 200 mN, with a noise floor of 0.5 nN. Moreover, the small mass of the force-sensing component enables CSM measurements at high frequencies and the acquisition of rapidly occurring events. Furthermore, the rapidly actuating indenter can acquire high-resolution nanoindentation maps in short timeframes.

The PI 85 SEM PicoIndenter is a depth-sensing indenter based on three plate capacitor actuation (inherently force-controlled) equipped with a nanoDMA III upgrade for continuous stiffness measurements up to 300Hz that can be integrated in a scanning electron microscope (SEM). This unique experimental setup makes it possible to perform quantitative nanomechanical quasi-static or dynamic experiments such as in situ continuous J-integral measurements or micromechanical spectroscopy (μMS) while simultaneously imaging within the SEM.

The direct piezo driven (inherently displacement-controlled) module is designed to use as a micro loading device for the measurement of forces and displacements inside the SEM. With adaptable tip geometries different loading modes from compression over tension to cyclic bending can be realised and directly correlated to high resolution in situ SEM images for the correlative determination of Poisson’s ratio, surface strains or crack extensions, to name a few.

Acquired in 2024, the Zeiss LEO1530 is specifically dedicated to in-situ micromechanical testing. It utilizes a thermionic field emission gun and a single condenser Gemini lens system for high-precision research. The system is designed to be compatible with various state-of-the-art mechanical testing setups for static and dynamic loading scenarios.

The JEOL JEM-2220FS “Nanomap” is a field emission gun (scanning) transmission electron microscope equipped with in-column energy filter, high speed CMOS camera, windowless EDS detector for chemical analysis and direct electron detector and scan generator for precession nanodiffraction mapping and 4D STEM. A wide range of in situ holders along with a high-speed CMOS detector enables imaging dynamical processes in complex materials with nanometer resolution. A unique setup combining in column omega filter, direct electron detector and programmable scan generator allows to carry out energy-filtered 4D STEM and precession nanodiffraction mapping.

The Rigaku SmartLab is a state-of-the art general-purpose XRD system equipped with a high-precision 5-circle goniometer, i.e. featuring an in-plane arm for measurements without the need for sample tilting.

The TS 600 Tensile Stage is a advanced sample stage for in-situ X-ray investigation of stress/strain behavior in foils and thin films. The stage can be used in transmission and reflection mode on synchrotrons and commercial diffractometers alike. At ESI, we also use it with our CLSM for in-situ straining and imaging of the surface and record electrical resistance while straining.

SAXS analysis is a non-destructive characterization method which offers insights into size, shape, distribution, and internal arrangements of nanostructures. This information is crucial for materials science, polymer research, biophysics, pharmacy and nanotechnology development. The Nanostar SAXS system by Bruker AXS (Karlsruhe, Germany) is a versatile device designed for analyzing nanostructures and molecular structures ranging from 1 to 125 nm.

The Bruker D2 Phaser is a fully self-contained benchtop XRD system, capable of high-throughput phase ID measurements on powdered and small-outline bulk and film samples. Phase identification can be carried out either directly in-system or on a user’s dedicated workstation. Typical applications include fast sample screening for parameter studies, as well as medium-to-high resolution phase characterization on selected samples.

The bending module of K&W is dedicated to bending experiments and depending on the used counter bearings three-point and four-point bending experiments can be performed with varying span widths. The advantage compared to the tensile machine is the capability to perform the experiments in combination with EBSD using comparably small working distances to perform high-resolution imaging.

The fatigue testing device of K&W is the youngest member in our mesoscale testing fleet. It combines the possibilities of the state-of-the-art tensile testing module with the exciting opportunities in the area of fatigue testing. The cyclic loading is superimposed onto the mechanically induced static pre-load with a piezoelectric element that allows, depending on the necessary displacement, a testing frequency of several Hz.

The tensile testing machine of K&W is a versatile small-scale testing machine, which can be used inside a scanning electron microscope (SEM) but also outside underneath a light-microscope or atomic force microscope (AFM) to monitor the deformation behavior of samples during the experiments. It can be utilized for classical tensile tests but also bending or compression experiments. Depending on the shape and size of the specimens, different specimen clamps can be installed. In addition, it can be also tilted by 70° within the SEM that allows to perform electron back scatter diffraction (EBSD) measurements. The imposition of the load is symmetrical so that image features do not move out of the area of interest.

The Hysitron TS 77 Select nanomechanical and nanotribological test system built around Bruker’s renowned TriboScope capacitive transducer technology is a test system delivering reliable mechanical and tribological characterization over nanometer-to-micrometer length scales. The installed transducer allows to perform different micro- and nano-mechanical tests with both normal and lateral force-displacement sensing. This enables ESI to perform standard depth-sensing nanoindentation within the loading force range up to 10 mN or displacement range up to 5 μm with options to run in displacement or load controlled tests with a constant loading or displacement rate, pillar or special specimen’s compression testing, tribological and adhesion scratch testing, wear tests enabling the abrasion of the specified sample area and the height imaging of the specimens with the indenter tip in contact mode, scanning over the surface of the specimen. The TS 77 Select test system allows manual testing, automation, and additionally fast mechanical properties mapping with visualization of the reduced elastic modulus and hardness over the tested area.

The LEO 1540XB is a dual beam FIB workstation equipped with a field emission gun (FEG). It uses a highly focused Ga+ ion beam (2-30 keV) to precisely mill materials at the nanometer scale. It is primarily used at the ESI to fabricate micro-mechanical test specimens and prepare high-quality samples for TEM analysis.

The Zeiss Auriga LaserFIB combines CrossBeam technology (Ga+ ion FIB and Gemini SEM) with an integrated femtosecond pulse laser. The laser allows for material removal rates several orders of magnitude higher than standard FIB, with minimal thermal damage. It is an ideal tool for rapid sample preparation on the mesoscale and subsequent high-precision FIB processing.

The Nanoscribe Photonic Professional GT2 is a high-precision microfabrication unit based on multi-photon lithography. By utilizing localized curing of photo-resins within a tiny focal spot (voxel), it enables the production of complex 3D polymer structures with feature sizes down to 160 nm—about 2 to 4 orders of magnitude smaller than standard resin-based 3D printers. The system's open architecture allows for the use of both standard and custom resins, while a live camera view ensures precise positioning on various substrates.

A versatile fatigue and quasi-static testing machine, frequently used for inducing fatigue pre-cracks in fracture mechanics specimens. While the load frame is classic, the control unit has been modernized to current standards.

A powerful resonance testing machine for energy-efficient push-pull, bending, or torsion experiments. It is primarily used for crack propagation measurements at elevated temperatures, often utilizing a vacuum furnace (up to 800°C at 10-5 mbar).

Designed for rotary bending fatigue experiments to test metallic materials. It can operate at 6000 or 12000 rotations per minute and can be fitted with an environmental chamber to simulate conditions in liquids, such as those found in water turbines.

The ElectroPuls® E3000 is an electrodynamic tabletop instrument for dynamic and static experiments. At ESI, it is primarily used for fatigue crack propagation. Its large daylight opening allows for the integration of furnaces or environmental chambers.

For the characterization of materials with near-atomic resolution, Atom Probe Tomography (APT) is of special interest. In atom probe tomography, a DC voltage of several kilovolts (5-15 kV) is applied to a tip with a tip radius of 20-50 nm. By means of a superimposed voltage or laser pulse, atoms are removed from the surface by the effect of field evaporation and accelerated onto a position-sensitive detector. The UV laser (wavelength: 355 nm) of the LEAP 5000 XR enables investigations of complex materials, ceramics and even geological materials.

For the characterization of materials with near-atomic resolution, Atom Probe Tomography (APT) is of special interest. The detector simultaneously records the time of flight as well as the positions of the arriving ions, enabling a 3D reconstruction of the ablated tip providing information about its chemical structure. Main applications: precipitation reactions, grain boundary segregation, chemical clustering, multifunctional thin films.

Site-specific sample preparation for transmission electron microscopy (TEM), and atom probe tomography (APT) requires specific preparation methods. At the Department is available the Dual Beam Focused Ion Beam Versa 3D device manufactured by FEI. This microscope incorporates a focused ion beam column (FIB) and a scanning electron microscope column (SEM). This duality offers the possibility of cross-section imaging during the ion beam does material milling/etching and/or deposition. In combination with Energy Dispersive Spectroscopy (EDS) enables elemental mapping, and in combination with Electron Backscatter Diffraction (EBSD) offers the possibility of crystallographic analysis.

Our laser ablation system, the microPREPTM PRO FEMTO, offers a groundbreaking solution for precise material processing and sample preparation. Equipped with a state-of-the-art femtosecond laser, it enables material removal with micrometer precision while minimizing thermal effects on the material. This system facilitates the rapid and straightforward production of sample structures, such as microtip arrays and half-grids, directly from the material, paving the way for revolutionary advancements in correlative microscopy. Microtip arrays are coupons with 15 tips (radius <30 μm) that can be finalized for atom probe tomography (APT) in just a few steps using focused ion beam (FIB) technology. By eliminating the need for complex lift-out procedures, the system reduces effort and enhances the reliability of sample preparation. Half-grids, on the other hand, are semicircular structures that enable the simultaneous application of APT and transmission electron microscopy (TEM) on the exact same site, significantly simplifying correlative microscopy. The combination of femtosecond laser technology and electron backscatter diffraction (EBSD) allows for the precise preparation of site-specific features, such as grain boundaries. These capabilities make the microPREPTM PRO FEMTO an indispensable tool for cutting-edge materials research.

SEM is widely used to study the microstructure and the chemical composition of a wide range of organic and inorganic materials. The electron beam, focused by an electromagnetic lens system, is scanning across the sample’s surface, which is located in an evacuated specimen chamber. Due to the interaction between electron beam and sample several signals are generated, which can be measured by various detectors. These signals provide information from the topography, the chemical composition and the microstructure.

Ion milling systems are widely used as instruments for preparing surfaces as well as cross-section samples for scanning electron microscopy (SEM), with applications to fields such as materials science and semiconductor research. The two types of ion-milling methods commonly used for SEM samples are flat milling and cross-section milling. Cross-section Milling is used to produce wider, undistorted cross-sections without applying mechanical stress to the sample. Flat Milling is used for removing surface layer artifacts and final polish after traditional mechanical polishing techniques.

For the characterization of materials with near-atomic resolution, Atom Probe Tomography (APT) is of special interest. In atom probe tomography, a DC voltage of several kilovolts (5-15 kV) is applied to a tip with a tip radius of 20-50 nm. By means of a superimposed voltage or laser pulse, atoms are removed from the surface by the effect of field evaporation and accelerated onto a position-sensitive detector. The UV laser (wavelength: 355 nm) of the LEAP 5000 XR enables investigations of complex materials, ceramics and even geological materials.

The JEOL JEM-2220FS “Nanomap” is a field emission gun (scanning) transmission electron microscope equipped with in-column energy filter, high speed CMOS camera, windowless EDS detector for chemical analysis and direct electron detector and scan generator for precession nanodiffraction mapping and 4D STEM. A wide range of in situ holders along with a high-speed CMOS detector enables imaging dynamical processes in complex materials with nanometer resolution. A unique setup combining in column omega filter, direct electron detector and programmable scan generator allows to carry out energy-filtered 4D STEM and precession nanodiffraction mapping.

The Rigaku SmartLab is a state-of-the art general-purpose XRD system equipped with a high-precision 5-circle goniometer, i.e. featuring an in-plane arm for measurements without the need for sample tilting.

The field emission SEM produces ultra-high-resolution images of conductive samples. The microscope is mainly used for topographical evaluation and manual and automated inclusion analysis in steels. The JEOL JSM-7200F has an in-lens Schottky field-emitting cathode (0.01-30 kV) and is equipped with various state-of-the-art detectors. Due to its high optical and chemical resolution and rapid data reprocessing, fast and reliable measurements can be performed. Elemental analysis is performed with AZtec (Oxford Instruments).

The DSA10HT is used for measuring the contact angle of a molten metal specimen on a solid substrate at high temperatures, thereby determining the wettability of the substrate by the melt.

The HT-CSLM consists of an ellipsoid heating chamber with a laser head equipped with a 408 nm wavelength semiconductor laser. The microscope is used to observe surfaces of samples at elevated temperatures up to 1750°C through thermal etching.

A custom-built high-vacuum system (1e-6 mbar) specifically designed for the growth of organic semiconductor thin films and nanostructures. This HWE chamber allows for the controlled evaporation of organic molecules and even enables the recording of electrical responses during film formation on operational transistors.

A custom-built setup based on a laser engraver with multi-wavelength options. It is dedicated to controllable photocatalysis of metallic nanoparticles and high-resolution laser patterning.

A versatile microprobe station for electrical characterization of 2D material-based devices. It allows for simultaneous optical and electrical measurements under varying temperatures and magnetic fields.

This custom-built tube lens system is used for the precise stacking of 2D materials into complex van der Waals heterostructures under ambient conditions. It offers exceptional rotational precision and multiple degrees of freedom for the stamp and substrate.

This custom-built two-unit Ar glove box system is specifically designed for the handling and assembly of air-sensitive 2D materials. It features a specialized motorized 2D materials stamping stage that enables the creation of water-bubble-free interfaces. The system provides a controlled inert atmosphere, ensuring the integrity of sensitive flakes during the entire fabrication process.

A dedicated MFP-3D configuration for the investigation of magnetic properties and biological materials. It allows for the application of external magnetic fields during scanning to study domain structures and magnetic responses.

This furnace is the heart of a chemical vapor deposition (CVD) setup specialized in the growth of Transition Metal Dichalcogenides (TMDCs) and the study of phase transitions in minerals. It is integrated with a glovebox for contamination-free sample handling.

A dedicated MFP-3D configuration for the investigation of magnetic properties and biological materials. It allows for the application of external magnetic fields during scanning to study domain structures and magnetic responses.

This MFP-3D system is a joint acquisition with the Department of Polymer Engineering and Science. It is specifically optimized for biological materials and polymers, featuring specialized temperature control and high-end vibration isolation.

An advanced AFM system coupled to a Horiba Labram Evolution spectrometer, enabling Tip-Enhanced Raman Spectroscopy (TERS). A specialty of the 2D Mat_Lab is the in-operando frequency modulated Kelvin Probe Force Microscopy (KPFM). This setup is used in cooperation with the Chair of Physics for raw material mineralogy (Rohrstoffmineralogie).

An Ultra-High Vacuum (UHV) system for atomic-scale characterization and in-situ organic thin film growth. Recently modernized with an Anfatec controller, it allows for easy access to all dynamic modes. The system combines high-resolution imaging with integrated sample preparation tools.

The Nanoscope III Multimode is a versatile workhorse for studying various surfaces, from semiconductors to metals. It is exceptionally well-equipped with various scanners and holders to support a wide array of AFM and STM modes.

A high-precision system for determining the surface free energy of solids. It features an automated liquid revolver and an environmental chamber for measurements under inert gas or controlled temperatures. This laboratory has a proven track record of excellence in international proficiency tests (ofi).

This specialized drop shape analysis device is designed for extremely small volumes, utilizing a piezo-driven dispenser to create droplets as small as 100 pl. This micro-scale dispensing is crucial for investigating surface patterns, individual fibers, and inhomogeneous surfaces where standard droplets would be too large.

Bruker’s Dimension Icon® brings the highest levels of performance, functionality, and AFM accessibility to nanoscale researchers in science and industry. Building upon the world’s most utilized large-sample AFM platform, it is the culmination of decades of technological innovation, customer feedback, and industry-leading application flexibility. The system has been designed from top to bottom to deliver the revolutionary low drift and low noise that allows users to achieve artifact-free images in minutes instead of hours. At ESI, in addition to contact mode and intermittent contact mode (tapping), our Icon is equipped with Scan Asyst, Magnetic Force measurements (MFM), contact resistance (CR) and nanomechanical cantilevers (indent with AFM) for mechanical properties, as well as heating/cooling stages (-10°C up to 250°C).

Atomic force microscopy is a very high- resolution type of scanning probe microscopy.

Nano-IR is a combination of high-resolution scanning probe microscopy and photo- induced forces microscopy (IR spectroscopic) measurement. AFM: Spectroscopy:

The Horiba FuelCon Evaluator C50-HT is a test bench for solid oxide fuel cells, solid oxide electrolysis cells and reversible solid oxide cells. Its gas supply and impedance spectrometer support electrochemical characterization by impedance spectroscopy and current-voltage measurements.

The Netzsch DIL 402 PC determines thermal expansion coefficients of ionic and mixed ionic-electronic conducting complex oxides as a function of temperature and oxygen partial pressure. It is also used to determine sintering curves for optimizing ceramic preparation.

The symmetric Setaram TAG 16 precision thermobalance is coupled with a Pfeiffer Vacuum Thermostar GSD 301 T1 mass spectrometer for TG-MS. It is used to study oxygen nonstoichiometry of complex oxides and the stability of SOFC cathode materials in water- and carbon-dioxide-containing atmospheres.

The Bruker D8 Advance X-ray diffractometer is used for structural analysis of powders and polycrystalline layers. It supports crystal-structure identification, phase-purity checks, secondary-phase analysis and Rietveld refinement.

This computer-controlled scanning electron microscope is equipped for analysis and imaging in high-vacuum and variable-pressure operation. The source page identifies a tungsten cathode, optional LaB6 cathode, triple-lens electron optics with Optibeam beam control and an EDX detector.

The Novocontrol Alpha-A High Precision frequency analyzer is used to determine bulk and grain-boundary conductivities of electroceramics.

The Netzsch DSC 404 C Pegasus high-temperature differential scanning calorimeter is used to determine thermodynamic properties of high-performance materials.

The CILAS 1064 L performs fully automatic measurements of particle-size distributions for powders in suspension and particles in emulsions using laser diffraction.